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Inductively coupled plasma : ウィキペディア英語版
Inductively coupled plasma

An inductively coupled plasma (ICP) is a type of plasma source in which the energy is supplied by electric currents which are produced by electromagnetic induction, that is, by time-varying magnetic fields.〔

==Operation==
There are three types of ICP geometries: planar (Fig. 2 (a)), cylindrical (Fig. 2 (b)), and half-toroidal (Fig. 2 (c)).
In planar geometry, the electrode is a length of flat metal wound like a spiral (or coil). In cylindrical geometry, it is like a helical spring. In half-toroidal geometry, it is toroidal solenoid cut along its main diameter to two equal halves.
When a time-varying electric current is passed through the coil, it creates a time-varying magnetic field around it, which in turn induces azimuthal electric field in the rarefied gas, leading to the formation of the figure-8 electron trajectories〔 providing a plasma generation (see Hamilton-Jacobi equation in electromagnetic fields). Argon is one example of a commonly used rarefied gas.

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